- Microprocessor controller allows for complete automatic processing.*
- All internal surfaces are inert to CO2 and ultra pure alcohols.*
- Repeatable operating parameters insuring reproducibility of results.*
- Integrated temperature controls.*
- Internal rupture disc built in for safety. *
- Processes up to 5 x 4" (100mm) diam. wafers per run; comes with additional HF compatible wafer holders to process 5 x 3" (75mm), 5 x 2" (50mm) diameter wafers or 5 x 10mm square die (Tousimis HF compatible Wafer Holders* can be used to transport and process your wafers and die from HF).
- All electronic components meet CE, UL and/or U.S. Military Specifications.
- Static pressure control module pre-set for automatic safe pressure stability.
- 0.08µm internal filtration system delivers clean filtered LCO2 to process chamber. *
- Under-lit chamber with viewing window facilitates operator chamber status viewing.
- An efficient adiabatic cooling system*, capable of cooling the chamber from ambient room temperature to near 0°C, in less than 3 minutes and maintains temperature automatically during both FILL and PURGE modes.*
- LED's instantly indicate process mode at a glance.*
- Clean room static-free compatible design.
- For added safety and convenience, the U.S. Patented SOTER™ condenser* quietly captures exhaust and alcohols.
- Unique chamber inserts* allow variance of chamber I.D. This maximizes efficiency in LCO2 consumption and processing time.
Autosamdri®-815B, Series B
- Process up to 4" (100mm) wafers
- Automatic Supercritical Point Dryer
- Minimal Facility Utility Requirements
- Made in U.S.A.
- The Supercritical Autosamdri®-815B, Series B System was developed by Dr. A. J. Tousimis and our team of long-standing associates within the tousimis® SAMDRI design group.
- Smooth operation and precise control are the Supercritical Autosamdri®-815B´s trademark; wafer holders and inserts are provided that allow anti-stiction processing up to 5 pieces of either 4" (100mm), 3" (75mm), 2" (50mm) wafers or 10mm square die per process run!
Features
Specifications
Standard Accessories
Optional Accessories
CPD MULTI-APPLICATIONS
- Cabinet: 14.25" (36.2cm) Width x 11.75" (29.8cm) Height x 25" (63.5cm) Length
- System Set-Up Area Required: 42" (107cm) Width x 30" (76cm) Depth
- Chamber size: 4.50" I.D. x 1.25" depth Chamber volume: 326 ml
- Temperature gauge range: -30°C to 60°C, Pressure gauge range: 0 to 2,000psi
- 120V/50-60Hz (Other voltage units also available. Please Inquire)
- LCO2 flow is controlled through Micro Metering Valves with Vernier handles for easily controlled flow rates.*
- LCO2 High Pressure braided stainless steel inert Teflon® lined hose. 10ft (~ 3m) long for clean room operation (at a nominal charge, other lengths available upon request).
- Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose. Flows LCO2 twice thru 0.5µm filters with 99.5% particulate retention prior to LCO2 entering Autosamdri®-815B.
- New SOTER™ Condenser* connects to exhaust hose. Captures all alcohol and deadens exhaust noise.*
- Static free Exhaust Tubing for all exhaust outlets.
- Internal stainless and nickel scintered filtration systems incorporated to protect lines, wafers, and valves down to 0.08µm.
- Spare Chamber O-ring (3), Chamber Lamp (1), and 5A Slo-Blow Fuses (2).
- 3 Chamber Inserts.* Enables original chamber ID reduction down to smaller chamber ID sizes for a range including: 4", 3", 2", and 1.25" !
- 4" (100mm), 3" (75mm), 2" (50mm) diameter Wafer Holders and 10mm square Die Holder included. Holders are HF compatible and can hold up to 5 wafers or die each.
- Free lifetime technical support consultation by our scientific staff.
- 2 year warranty on all parts and labor.
- 8760-02: :KNURL NUT for 4" and 6" Process Chamber
- 8760-40: :5 AMP FUSE for SAMDRI® Models: PVT-3D, 795, 815, 815B, 915B (Series A & Series B Only)
- 8770-10: :CHAMBER LAMP, 120Volt/60Hz
- 8770-32: :HIGH-PRESSURE HOSE, 5ft
- 8770-33: :HIGH-PRESSURE HOSE, 10ft
- 8770-60: :CHAMBER LID for 4" Process Chamber
- 8785: :Double T-Filter Assembly
- 8770-83B: :0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter.
- 8784-05: :Gasket for LCO2 Tank Connect
- 8770-51T/815B: :O-Ring for Autosamdri®-934 and Autosamdri®-815B
- 8770-46: :Flow Meter - Use with any 2.5", 3.4" and 4.0" dia. Autosamdri® Chamber (60 SCFH)
- 8770-53: :POWER CABLE
- 8770-54: :LCO2 TANK SCALE W/ REMOTE DISPLAY
- 8770-56A: :Step-Down Transformer, 200-240V → 110-120V, 3000W
- 8770-83A: :Internal 0.5µm 316SS Particulate Line Filter
- 8768B: :4" - 100mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768C: :3" - 75mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768D: :2" - 50mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768G: :1" - 25mm HF Compatible Wafer Holder
Holds 5 Wafers - 8768E: :10mm Square HF Compatible Chip Holder, Holds 5 Die
Application Images
Array of low stress silicon nitride coupled oscillators with gold actuation leads. 1,100x Cornell Nanoscale Facility and Department of Applied Physics, USA
High aspect ratio silicon gratings Massachusetts Institute of Technology
MEMS Electrostatic Comb Drive MEMX, New Mexico, USA
Tiltable Microplatform University of Michigan at Ann Arbor, Department of Engineering
Date: April 18-20, 2024
Location: WangYuanxing International Conference Center at Huaqiao University Xiamen Campus, China