Applications
The Samdri® line of Supercritical Point Dryers is successfully used to increase yield and uniformity of MEMS devices. Liquid carbon dioxide is the transitional fluid used to process your delicate MEMS. The tousimis Samdri® line of Supercritical Point Drying tools used for the MEMS CO2 dry release after wet etching is a most beneficial anti-stiction tool for the MEMS fab.

  • New Multi-Application Digital Critical Point Dryer
  • Patent Pending "Stasis Software" for Challenging Sample Types
  • Available in 1.25", 2.50" and 3.40" chamber sizes
  • Winner of 2012 Microscopy Today Innovation Award
  • Precision process control
  • Optional "Quick Release" sample holder (down to 2 µm in size)
  • Program and save custom recipes
  • Made in U.S.A.

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  • Process up to 1" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8779C

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  • Process up to 4" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780C

More Information


  • Process up to 6" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785C

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  • Process up to 4" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780D

More Information


  • Process up to 6" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785D

More Information


  • Process up to 8" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8786D

More Information

Application Images

RF MEMS Capacitive Switch NASA-Glenn Research Center/Communications Technology Division, USA

Released cantilevers after thermal annealing Universite Catholique de Louvain

A Sensor for Acoustic Emission VTT Technologies, Finland

ARTIFICIAL EYELID ACTUATOR MCNC

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Upcoming Exhibitions and Conferences

Visit us at the 2016 MEMS Symposium

Date: May 11, 2016

Location: Holiday Inn, San Jose, California

Visit us at the MSNO's 50th Anniversary May Conference

Date: May 18, 2016

Location: Dolan Science Center, John Carrol University, Ohio

Join us for the SEMS 52nd Annual Meeting

Date: May 18-20, 2016

Location: Hilton Pensacola Beach Gulf Front, Florida

Visit us for the 2016 UMB/CMMS Current EM Techniques Workshop

Date: May 24-25, 2016

Location: University of Maryland, Baltimore, Southern Management Campus Center and Electron Microscopy Core Imaging Facility (EMCIF)