Applications
The Samdri® line of Supercritical Point Dryers is successfully used to increase yield and uniformity of MEMS devices. Liquid carbon dioxide is the transitional fluid used to process your delicate MEMS. The tousimis Samdri® line of Supercritical Point Drying tools used for the MEMS CO2 dry release after wet etching is a most beneficial anti-stiction tool for the MEMS fab.

  • New Multi-Application Digital Critical Point Dryer
  • Patent Pending "Stasis Software" for Challenging Sample Types
  • Available in 1.25", 2.50" and 3.40" chamber sizes
  • Winner of 2012 Microscopy Today Innovation Award
  • Precision process control
  • Optional "Quick Release" sample holder (down to 2 µm in size)
  • Program and save custom recipes
  • Made in U.S.A.

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  • Process up to 1" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8779C

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  • Process up to 4" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780C

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  • Process up to 6" wafers
  • Automatic Supercritical Point Dryer
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785C

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  • Process up to 4" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8780D

More Information


  • Process up to 6" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8785D

More Information


  • Process up to 8" wafers
  • Fully Automatic Process
  • Low LCO2 Consumption
  • Small Foot Print design
  • Minimal Facility Utility Requirements
  • Made in U.S.A.
tousimis catalog# 8786D

More Information

Application Images

High aspect ratio silicon gratings Massachusetts Institute of Technology

View of Single Coupled Oscillator Made Out of Low Stress Silicon Nitride. 800x Cornell Nanoscale Facility and Department of Applied Physics, USA

RF MEMS Device Middle East Technical University, Turkey

RF MEMS Capacitive Switch NASA-Glenn Research Center/Communications Technology Division, USA

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Upcoming Exhibitions and Conferences

Visit us at the Microscopy & Microanalysis 2016 Meeting

Date: July 25-28, 2016

Location: Columbus Convention Center in Columbus, Ohio

Booth: # 909